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Microstructure and Phase Stability of Single Crystal NiAl Alloyed with Hf and Zr

机译:Hf和Zr合金单晶NiAl的组织和相稳定性

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摘要

Six near stoichiometric, NiAl single-crystal alloys, with 0.05-1.5 at.% of Hf and Zr additions plus Si impurities, were microstructurally analyzed in the as-cast, homogenized, and aged conditions. Hafnium-rich interdendritic regions, containing the Heusler phase (Ni2AlHf), were found in all the as-cast alloys containing Hf. Homogenization heat treatments partially reduced these interdendritic segregated regions. Transmission electron microscopy (TEM) observations of the as-cast and homogenized microstructures revealed the presence of a high density of fine Hf (or Zr) and Si-rich precipitates. These were identified as G-phase, Nil6X6Si7, or as an orthorhombic NiXSi phase, where X is Hf or Zr. Under these conditions the expected Heusler phase (beta') was almost completely absent. The Si responsible for the formation of the G and NiHfSi phases is the result of molten metal reacting with the Si-containing crucible used during the casting process. Varying the cooling rates after homogenization resulted in the refinement or complete suppression of the G and NiHfSi phases. In some of the alloys studied, long-term aging heat treatments resulted in the formation of Heusler precipitates, which were more stable at the aging temperature and coarsened at the expense of the G-phase. In other alloys, long-term aging resulted in the formation of the NiXSi phase. The stability of the Heusler or NiXSi phases can be traced to the reactive element (Hf or Zr) to silicon ratio. If the ratio is high, then the Heusler phase appears stable after long time aging. If the ratio is low, then the NiHfSi phase appears to be the stable phase.
机译:在铸态,均质化和时效条件下,对六种接近化学计量的NiAl单晶合金(添加了0.05-1.5 at。%的Hf和Zr和Si杂质)进行了微观结构分析。在所有含Hf的铸态合金中都发现了含有Heusler相(Ni2AlHf)的富树枝状区域。均质化热处理可部分减少这些树突间隔离区域。透射电子显微镜(TEM)对铸态和均质微结构的观察表明,存在高密度的细Hf(或Zr)和富Si沉淀物。这些被确定为G相,Nil6X6Si7或正交晶NiXSi相,其中X为Hf或Zr。在这些条件下,预期的Heusler相(β')几乎完全不存在。导致G和NiHfSi相形成的Si是熔融金属与铸造过程中使用的含Si坩埚反应的结果。均质后改变冷却速率会导致G和NiHfSi相的细化或完全抑制。在某些研究的合金中,长期时效热处理导致形成Heusler沉淀,这些沉淀在时效温度下更稳定,而以G相为代价则粗大化。在其他合金中,长期时效会导致NiXSi相的形成。 Heusler或NiXSi相的稳定性可以追溯到反应性元素(Hf或Zr)与硅的比率。如果该比率高,则在长时间老化之后,霍斯勒相显得稳定。如果该比率低,则NiHfSi相似乎是稳定相。

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